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NSR database version of May 3, 2024.

Search: Author = G.Battistig

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1997AM09      Nucl.Instrum.Methods Phys.Res. B122, 99 (1997)

G.Amsel, E.d'Artemare, G.Battistig, V.Morazzani, C.Ortega

A Characterisation of the Morphology of Porous Silicon Films by Proton Energy Loss Fluctuation Measurements with a Narrow Resonance in the ¹⁵N(p, αγ)¹²C Reaction

NUCLEAR REACTIONS ¹⁵N(p, α), E ≈ 429 keV; measured σ(E, θ); deduced porous silicon film morphology features.

doi: 10.1016/S0168-583X(96)00723-9
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1994BA86      Nucl.Instrum.Methods Phys.Res. B85, 326 (1994)

G.Battistig, G.Amsel, I.Trimaille, J.-J.Ganem, S.Rigo, F.C.Stedile, I.J.R.Baumvol, W.H.Schulte, H.W.Becker

High Resolution Low Energy Resonance Depth Profiling of ¹⁸O in Near Surface Isotopic Tracing Studies

NUCLEAR REACTIONS ¹⁸O(p, α), E ≈ resonance; measured σ(E); deduced Si oxidation processes features. Depth profiling of ¹⁸O, near surface isotopic training.

doi: 10.1016/0168-583X(94)95837-8
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1994BA87      Nucl.Instrum.Methods Phys.Res. B85, 572 (1994)

G.Battistig, G.Amsel, E.d'Artemare, A.L'Hoir

Multiple Scattering Induced Resolution Limits in Grazing Incidence Resonance Depth Profiling

NUCLEAR REACTIONS ¹⁸O(p, α), E=150-210 keV; measured σ(E); deduced resonance depth profiling resolution features, geometry dependence.

doi: 10.1016/0168-583X(94)95885-8
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1994ST13      Nucl.Instrum.Methods Phys.Res. B85, 248 (1994)

F.C.Stedile, I.J.R.Baumvol, J.-J.Ganem, S.Rigo, I.Trimaille, G.Battistig, W.H.Schulte, H.W.Becker

IBA Study of the Growth Mechanisms of Very Thin Silicon Oxide Films: The effect of wafer cleaning

NUCLEAR REACTIONS ^16,18O(α, α), E=1.8 MeV; measured Rutherford backscattering spectra; deduced very thin Si oxide films growth mechanisms features. Isotopic profiles from ion beam analysis methods.

doi: 10.1016/0168-583X(94)95821-1
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1992BA23      Nucl.Instrum.Methods Phys.Res. B66, 1 (1992)

G.Battistig, G.Amsel, E.d'Artemare, I.Vickridge

A Very Narrow Resonance in ¹⁸O(p, α)¹⁵N Near 150 keV: Application to isotopic tracing. II. High resolution depth profiling of ¹⁸O

NUCLEAR REACTIONS ¹⁸O(p, α), E ≈ 152-164 keV; measured relative yield vs E. ¹⁸O(p, γ), E ≈ resonance; measured γ-spectra. Depth profiling studies, Ta₂O₅, SiO₂ layers, sharp ¹⁸O-¹⁶O interfaces.

doi: 10.1016/0168-583X(92)96133-J
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1991BA54      Nucl.Instrum.Methods Phys.Res. B61, 369 (1991)

G.Battistig, G.Amsel, E.d'Artemare, I.Vickridge

A Very Narrow Resonance in ¹⁸O(p, α)¹⁵N Near 150 keV: Application to isotopic tracing. I. Resonance width measurement

NUCLEAR REACTIONS ¹⁸O(p, α), E ≈ 150 keV; measured α-spectra; deduced isotopic tracing relevance. ¹⁹F deduced resonance Γ.

doi: 10.1016/0168-583X(91)95308-Z
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