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Search: Author = F.W.Saris

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1983WA12      Nucl.Instrum.Methods 211, 193 (1983)

Z.L.Wang, J.F.M.Westendorp, F.W.Saris

An Investigation of Oxygen Indiffusion during Laser Cleaning/Annealing of Silicon by Means of the ¹⁶O(α, α₀)¹⁶O Resonance Scattering

NUCLEAR REACTIONS ¹⁶O(α, α), E=3.026, 3.056 MeV; measured yield vs E, σ; deduced no oxygen indiffusion in laser processing. ²⁰Ne deduced resonance, Γ, σ. Pulsed laser annealed, cleaned SiO₂ samples.

doi: 10.1016/0167-5087(83)90569-0
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