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NSR database version of May 10, 2024.

Search: Author = H.K.Schou

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1984NI08      J.Phys.(London) C17, 3519 (1984)

K.B.Nielsen, H.K.Schou, T.Lauritsen, G.Weyer, I.Stensgaard, J.W.Petersen, S.Damgaard

The Electric Quadrupole Hyperfine Interaction at Sites of Ion-Implanted Fluorine in Amorphous and Crystalline Silicon

NUCLEAR REACTIONS ¹⁹F(p, p'), E=2.02 MeV; measured γ(θ, H.t). ¹⁹F level deduced electric quadrupole coupling constant. Recoil ion implantation in Si.

doi: 10.1088/0022-3719/17/20/005
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